Ahmedabad, Gujarat, India
GST Number - 24AAICB8818J1ZE
Chemical Vapor Deposition System Chemical Vapor Deposition System Chemical Vapor Deposition System

Chemical Vapor Deposition System

1000000 INR/Unit

Product Details:

  • Temperature Range Room Temp. up to 1200C
  • Production Capacity 10-20 Batch/Day
  • Automation Grade Automatic
  • Accessories Gas Panels, Gas Flow Meters, Safety Interlocks, Exhaust System, Chiller (Optional)
  • Usage & Applications Material Coating, Semiconductor Fabrication, MEMS Production, Nanotechnology, Research & Development
  • Speed Variable Speed (Adjustable via PLC)
  • Model No CVD-IND-9000
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Chemical Vapor Deposition System Price And Quantity

  • 1 Unit
  • 1000000 INR/Unit

Chemical Vapor Deposition System Product Specifications

  • Custom Configurations - Standard 50 kg/batch up to 500 kg/batch
  • Electric Motor Driven
  • 10-20 Batch/Day
  • Mirror Polished (Process Chambers), Powder Coated Frame
  • Stainless Steel and Structural Steel Frame
  • Yes
  • Silver (Process Chambers), Yellow (Support Structure)
  • PLC/SCADA Based Automated Control
  • Room Temp. up to 1200C
  • Customized / Typical: 7.5 m x 4 m x 12 m
  • CVD-IND-9000
  • 3 Phase, 15-30 kW (Depending on Configuration)
  • Variable Speed (Adjustable via PLC)
  • Automatic
  • Onsite Installation & Commissioning Provided
  • Up to 98%
  • Electric
  • 20 kW Approx (Full Load)
  • Industrial Batch Reactor System
  • 50 Hz
  • 5 HP - 15 HP Motor
  • Automatic
  • Gas Flow Automation, Uniform Deposition, High Throughput, Precise Temperature and Pressure Control, Modular Design
  • Approx. 6,000 kg to 15,000 kg
  • 380-440 V
  • Chemical Vapor Deposition (CVD) System
  • Gas Panels, Gas Flow Meters, Safety Interlocks, Exhaust System, Chiller (Optional)
  • Material Coating, Semiconductor Fabrication, MEMS Production, Nanotechnology, Research & Development
  • Mass Flow Controlled, Customized for Different Gases
  • 30 min to 3 hours per batch (Process Specific)
  • Closed Loop Water Chiller (Optional)
  • 10^-3 to 10^-6 Torr (Process Dependent)
  • Integrated Alarms, Automatic Shut-off, Pressure Relief Valves
  • Low Maintenance with Quick Access Panels
  • 2% Across Substrate
  • H2, N2, O2, SiH4, NH3, WF6, B2H6, PH3, etc.
  • Can accommodate substrates up to 1.2 meters in diameter
  • Scrubber and Filtration Unit Attached

Product Description



Procure the lavish Chemical Vapor Deposition System, a best-seller crafted for noble industrial applications. Decorated with mirror-polished chambers and a robust stainless steel frame, this CVD system offers superior deposition uniformity (2% across substrate) and is customizable for a spectrum of process gases. Equipped with mass flow-controlled delivery, integrated alarms, and a high-throughput modular design, you ensure process repeatability and safety at every stage. Pick yours today to elevate semiconductor fabrication, MEMS production, and advanced material coatings-all under automatic, precise PLC/SCADA management.

Versatility and Performance: Uses and Applications

This Chemical Vapor Deposition System is engineered for diverse uses such as material coating, semiconductor fabrication, MEMS production, nanotechnology, and cutting-edge research. Commercial users across electronics, energy, and materials science benefit from its uniform deposition, programmable automation, and large substrate handling-making it indispensable for both pilot and production-scale needs. Standout features include precise gas flow control, rapid cycle times, and low maintenance, ensuring effortless integration into any advanced manufacturing or R&D setting.


Export Excellence: Delivery and Certifications

Every Chemical Vapor Deposition System is meticulously packaged and handed over at the designated Indian FOB port upon confirmation of your purchase order. The main export markets include Europe, North America, Southeast Asia, and the Middle East. Widely recognized for high safety and operational standards, it is supplied with all relevant certifications necessary for smooth international deployment. Rely on our attentive procurement process and comprehensive after-sales support for a seamless global experience.


FAQ's of Chemical Vapor Deposition System:


Q: How does the Chemical Vapor Deposition System achieve consistent deposition uniformity?

A: The system utilizes advanced gas flow automation, closed-loop temperature and pressure control, and uniform process chambers to ensure deposition uniformity up to 2% across the substrate, even for large diameters.

Q: What gases can be processed in this CVD system?

A: It is compatible with multiple process gases, including H2, N2, O2, SiH4, NH3, WF6, B2H6, and PH3. Customized gas delivery modules are available to match specific material or process requirements.

Q: When should preventive maintenance be performed on this machine?

A: Preventive maintenance can be kept minimal due to the system's quick-access panels and robust construction. Regular checks as outlined in the supplied manual are recommended, typically coinciding with scheduled batch production intervals.

Q: Where is installation and commissioning provided for this system?

A: Onsite installation and commissioning are provided across the customer's location, ensuring optimal setup and training for your team directly at your facility.

Q: What are the key benefits of using this CVD system for industrial applications?

A: Users benefit from high process throughput, precise automation, scalable batch capacity, broad gas compatibility, and significant efficiency gains, making it ideal for both R&D and volume manufacturing.

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